Japan, Nov. 7 -- TOKYO ELECTRON LTD has got intellectual property rights for 'DEVICE PERFORMING DEPOSITION TREATMENT ON SUBSTRATE, AND METHOD FOR USING VACUUM CHUCK MECHANISM PROVIDED IN DEVICE PERFORMING DEPOSITION TREATMENT ON SUBSTRATE.' Other related details are as follows:
Application Number: JP,2021-093838
Category (FI): H01L21/31@B,C23C16/455,H01L21/316@X
Stage: Grant (IP right document published.)
Filing Date: June 3, 2021
Publication Date: Dec. 15, 2022
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication....