Japan Intellectual Property Rights: ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND MANUFACTURING METHOD OF ELECTRONIC DEVICE

Japan, Oct. 30 -- FUJIFILM CORP has got intellectual property rights for 'ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND MANUFACTURING METHOD OF ELECTRONIC DEVICE.' Other related details are as follows:

Application Number: JP,2023-038053

Category (FI): G03F7/039,601,G03F7/038,601,G03F7/004,503@A,C08L101/00,C08K5/00,G03F7/20,521,G03F7/20,501

Stage: Grant (IP right document published.)

Filing Date: March 10, 2023

Publication Date: June 13, 2023

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

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