MUMBAI, India, June 6 -- Intellectual Property India has published a patent application (202517048906 A) filed by Agc Inc., Tokyo, on May 21, for 'water repellent composition, production method for fluorine-free polymer, treatment method and article.'
Inventor(s) include Sugiyama Kazunori; Yamasaki Ryujiro; and Onishi Shunsuke.
The application for the patent was published on June 6, under issue no. 23/2025.
According to the abstract released by the Intellectual Property India: "The present invention relates to a water repellent composition comprising a fluorine-free polymer having a structural unit based on a long-chain alkyl (meth)acrylate monomer, a structural unit based on a halogenated vinyl monomer and a structural unit based on a m...