Intellectual Property India Publishes Patent Application for 'Water Repellent Composition, Method For Producing Non-Fluorine Polymer, Processing Method And Article' Filed by Agc Inc.

MUMBAI, India, June 13 -- Intellectual Property India has published a patent application (202517048965 A) filed by Agc Inc., Tokyo, on May 21, for 'water repellent composition, method for producing non-fluorine polymer, processing method and article.'

Inventor(s) include Onishi Shunsuke; Kamijo Yuzuka; Shiota Yukiko; Yamasaki Ryujiro; and Sugiyama Kazunori.

The application for the patent was published on June 13, under issue no. 24/2025.

According to the abstract released by the Intellectual Property India: "The present invention relates to a water repellent composition which contains a non-fluorine polymer that has a constituent unit derived from a long-chain alkyl (meth)acrylate monomer, a constituent unit derived from a vinyl halide m...