Intellectual Property India Publishes Patent Application for 'Use Of Co2 Rich Gas As A Sweeping Gas In A Chemical Plant' Filed by Topsoe A/S

MUMBAI, India, June 6 -- Intellectual Property India has published a patent application (202517020667 A) filed by Topsoe A/S, Lyngby, Denmark, on March 7, for 'use of co2 rich gas as a sweeping gas in a chemical plant.'

Inventor(s) include Christensen Steffen Spangsberg.

The application for the patent was published on June 6, under issue no. 23/2025.

According to the abstract released by the Intellectual Property India: "A plant e.g. a syngas plant or hydrogen plant or a combined syngas and hydrogen plant is provided. The plant comprises a reforming section a CO2 removal section and a first electrolysis unit. A first portion of a first CO2 rich stream outputted from the CO2 removal section is arranged to be supplied to the anode of the f...