Intellectual Property India Publishes Patent Application for 'Systems And Methods For Detecting Defects In Photolithographic Patterns' Filed by Samsung Electronics Co. Ltd.

MUMBAI, India, Sept. 5 -- Intellectual Property India has published a patent application (202441011195 A) filed by Samsung Electronics Co. Ltd., Gyeonggi, Republic of Korea, on Feb. 17, 2024, for 'systems and methods for detecting defects in photolithographic patterns.'

Inventor(s) include Adiga, Shashishekara Parampalli; Shinde, Prashant Pandurang; Kolake, Subramanya Mayya; Pai, Priyadarshini Panemangalore; Hwang, Myungsoo; and Park, Changmin.

The application for the patent was published on Sept. 5, under issue no. 36/2025.

According to the abstract released by the Intellectual Property India: "Disclosed are systems (403) and methods (1100) for detecting defects in photolithographic patterns. Initially for each of a plurality of scannin...