MUMBAI, India, Jan. 9 -- Intellectual Property India has published a patent application (202521108356 A) filed by Alpesh Prakash Sonar; and Divyani Alpesh Sonar, Thane, Maharashtra, on Nov. 8, 2025, for 'system and method for configuration-driven fine-tuning and deployment of machine learning models.'
Inventor(s) include Alpesh Prakash Sonar; and Divyani Alpesh Sonar.
The application for the patent was published on Dec. 12, under issue no. 50/2025.
According to the abstract released by the Intellectual Property India: "The present invention relates to a retraining system (100) and method (202-232) for configuration-driven fine-tuning of private or pre-trained machine learning models. An electronic device (102) with a device processor (10...