MUMBAI, India, Jan. 2 -- Intellectual Property India has published a patent application (202541122459 A) filed by Shreeshayana R; Atme College Of Engineering, Mysuru; and Dr. Sathish K R, Mysuru, Karnataka, on Dec. 5, 2025, for 'system and method for 3d printing using recycled polymer filament.'
Inventor(s) include Shreeshayana R; Dr. Sathish K R; Dr. Parthasarathy L; Dr. Raghavendra L; Kavyashree S; Swathi C A; Maria Sushma S; Swapna H; Dr. Praveen Kumar M; and Dr. Shakunthala C.
The application for the patent was published on Jan. 2, under issue no. 01/2026.
According to the abstract released by the Intellectual Property India: "The invention relates to a system and method for producing high-quality recycled filament for use in fused d...