Intellectual Property India Publishes Patent Application for 'Suture Material Impregnated With Carbon Dots For Better Visibility' Filed by Dr. D. Y. Patil Vidyapeeth

MUMBAI, India, Jan. 9 -- Intellectual Property India has published a patent application (202521123774 A) filed by Dr. D. Y. Patil Vidyapeeth, Pune, Maharashtra, on Dec. 8, 2025, for 'suture material impregnated with carbon dots for better visibility.'

Inventor(s) include Agarwal, Neha; and Rudagi, B. M.

The application for the patent was published on Jan. 9, under issue no. 02/2026.

According to the abstract released by the Intellectual Property India: "The present invention relates to a fluorescent suture comprising a suture-forming polymer and carbon dots dispersed within the polymer. The carbon dots are functionalized to emit fluorescence when exposed to specific light, enhancing intraoperative visibility. The sutures can be made from...