Intellectual Property India Publishes Patent Application for 'Semiconductor Structure And Manufacturing Method Therefor' Filed by Cxmt Corporation

MUMBAI, India, June 6 -- Intellectual Property India has published a patent application (202417095050 A) filed by Cxmt Corporation, Anhui, China, on Dec. 3, 2024, for 'semiconductor structure and manufacturing method therefor.'

Inventor(s) include Fu, You; Wu, Shuangshuang; Li, Tzung-Han; Liu, Chih-Cheng; and Chen, Xiaolong.

The application for the patent was published on June 6, under issue no. 23/2025.

According to the abstract released by the Intellectual Property India: "Disclosed are a semiconductor structure and a manufacturing method therefor. The semiconductor structure comprises: a dielectric layer, which comprises a deep trench capacitor array and an isolation structure, wherein the deep trench capacitor array comprises a plura...