Intellectual Property India Publishes Patent Application for 'Scalable Flow Field For An Electrochemical Cell And Method Of High-Speed Manufacturing The Same' Filed by Evoloh, Inc.

MUMBAI, India, Sept. 12 -- Intellectual Property India has published a patent application (202517079261 A) filed by Evoloh, Inc., Palo Alto, U.S.A., on Aug. 21, for 'scalable flow field for an electrochemical cell and method of high-speed manufacturing the same.'

Inventor(s) include Blanchet, Scott.

The application for the patent was published on Sept. 12, under issue no. 37/2025.

According to the abstract released by the Intellectual Property India: "The present application relates to a flow field for use in an electrolysis cell comprising one or more sheets of porous material with a corrugated structure. The electrolysis cell comprises a membrane, an anode, a cathode, an anode reinforcement layer, a cathode reinforcement layer, an anod...