MUMBAI, India, June 13 -- Intellectual Property India has published a patent application (202517051082 A) filed by Sicpa Holding Sa, Prilly, Switzerland, on May 28, for 'rylene-based uv curable security ink compositions.'
Inventor(s) include Pasquier, Cecile; Kaenel, Cindy; Cartesio, Salvatore; Bailleul, Mickael; Eligert, Laurent; and Vienet, Arnaud.
The application for the patent was published on June 13, under issue no. 24/2025.
According to the abstract released by the Intellectual Property India: "The invention relates to the field of UV curable security ink compositions comprising rylene-based compounds, radically curable monomers, oligomers or mixtures thereof, and radical photoinitiators. The invention further relates to security ...