MUMBAI, India, Oct. 31 -- Intellectual Property India has published a patent application (202417030196 A) filed by Sumitomo Chemical Company, Ltd.; and Dover Chemical Corporation, Tokyo, on April 15, 2024, for 'polymeric composition having resistance to both nox discoloration and extrusion-processing degradation.'
Inventor(s) include Matsuoka, Fumiaki; Jakupca, Michael; Cook, Shawn; and Regula, John.
The application for the patent was published on Oct. 31, under issue no. 44/2025.
According to the abstract released by the Intellectual Property India: "A composition having: a themophastic; a first chemical compound having the structure: wherein, each R1, R2, R4, and R5 is independently selected and is a hydrogen atom, a C1-8 alkyl moiety,...