Intellectual Property India Publishes Patent Application for 'Polymeric Composition Comprising A Blend Of Poly(Aryl Ether Sulfone) Polymers Suitable For Manufacturing Articles' Filed by Solvay Specialty Polymers USA, Llc

MUMBAI, India, July 5 -- Intellectual Property India has published a patent application (202517059459 A) filed by Solvay Specialty Polymers USA, Llc, Alpharetta, U.S.A., on June 20, for 'polymeric composition comprising a blend of poly(aryl ether sulfone) polymers suitable for manufacturing articles.'

Inventor(s) include Pomilla, Francesca Rita; Di Nicolo, Emanuele; and Nair, Kamlesh P.

The application for the patent was published on July 4, under issue no. 27/2025.

According to the abstract released by the Intellectual Property India: "The invention relates to a polymeric composition comprising a blend of a sulfonated and/or carboxylated sulfone copolymer (P1) and a polyarylethersulfone polymer (P2) wherein the copolymer (P1) comprises ...