MUMBAI, India, March 15 -- Intellectual Property India has published a patent application (202517016316 A) filed by Beiersdorf Ag, Hamburg, Germany, on Feb. 25, for 'novel skin care composition for the treatment of acne.'
Inventor(s) include Huepeden, Jennifer; Foelster, Heike; Reuter, Joern Hendrik; Gallinat, Stefan; and Ahle, Charlotte.
The application for the patent was published on March 14, under issue no. 11/2025.
According to the abstract released by the Intellectual Property India: "The present invention generally relates to the field of skin care. More particularly, the invention relates to a cosmetic or therapeutic skin care composition comprising at least one skin-health promoting Staphylococcus strain that exerts an antimicro...