Intellectual Property India Publishes Patent Application for 'Mixed Sio 4 And Po 4 System For Fabricating High-Capacity Cathodes' Filed by Mitra Future Technologies, Inc.

MUMBAI, India, Feb. 21 -- Intellectual Property India has published a patent application (202417102576 A) filed by Mitra Future Technologies, Inc., Mountain View, U.S.A., on Dec. 24, 2024, for 'mixed sio 4 and po 4 system for fabricating high-capacity cathodes.'

Inventor(s) include Csernica, Peter; Pratt, Russell; Gopal, Chirranjeevi; Chueh, William; Lampert, Jordan; Luo, Liu; and Bowring, Andrea.

The application for the patent was published on Feb. 21, under issue no. 08/2025.

According to the abstract released by the Intellectual Property India: "The present technology discloses lithium metal polyanion (LMX) cathode compounds which contain a mixture of SiO4 and PO4 anions. Compounds based on silicate SiO4 anions can exhibit significant...