Intellectual Property India Publishes Patent Application for 'Methods For Producing Halogenated Alkene Compound And Fluorinated Alkyne Compound' Filed by Daikin Industries, Ltd.

MUMBAI, India, Sept. 26 -- Intellectual Property India has published a patent application (202548059022 A) filed by Daikin Industries, Ltd., Osaka, Japan, on June 19, for 'methods for producing halogenated alkene compound and fluorinated alkyne compound.'

Inventor(s) include Etou, Yuusuke; and Nakamura, Shingo.

The application for the patent was published on Sept. 26, under issue no. 39/2025.

According to the abstract released by the Intellectual Property India: "A halogenated alkene compound and a halogenated alkyne compound are obtained at a high conversion rate and high selectivity by employing any of the following methods (1) to (4): 10 (1) a halogenated butane compound represented by CX1X2X3CHX4CFHCX5X6X7, wherein X1, X2, X3, X4, X5...