Intellectual Property India Publishes Patent Application for 'Method For The Volumetric Printing Through Holograms Using High Wavelength Radiation' Filed by Innomaq 21, S.L.

MUMBAI, India, May 16 -- Intellectual Property India has published a patent application (202517039090 A) filed by Innomaq 21, S.L., Madrid, on April 23, for 'method for the volumetric printing through holograms using high wavelength radiation.'

Inventor(s) include Valls Angles, Isaac.

The application for the patent was published on May 16, under issue no. 20/2025.

According to the abstract released by the Intellectual Property India: "The present invention relates to volumetric additive manufacturing (3D printing) through holograms for manufacturing high performance components with high mechanical properties at low cost and with low environmental impact from a wide variety of different materials, including but not limited to metallic mat...