MUMBAI, India, May 30 -- Intellectual Property India has published a patent application (202517044292 A) filed by Agc Inc., Tokyo, on May 7, for 'method for producing fluoroester compound.'
Inventor(s) include Watanabe, Koki; Aoyama, Motoshi; and Murotani, Eisuke.
The application for the patent was published on May 30, under issue no. 22/2025.
According to the abstract released by the Intellectual Property India: "A method for producing a fluoroester compound, which includes fluorinating an ester compound having at least one atom or bond capable of being fluorinated, in an organic solvent having fluorine gas introduced thereinto, wherein the organic solvent contains a compound having a C-H bond, the amount of the compound having a C-H bo...