MUMBAI, India, June 13 -- Intellectual Property India has published a patent application (202517041795 A) filed by Cnbm Research Institute For Advanced Glass Materials Group Co. Ltd., Anhui, China, on April 30, for 'method for preparing small-width linear structure on upper surface of target layer of layer stack and application thereof.'

Inventor(s) include Shen, Yilei; and Stoelzel, Marko.

The application for the patent was published on June 13, under issue no. 24/2025.

According to the abstract released by the Intellectual Property India: "The present invention discloses a method for preparing a small-width linear structure on the upper surface of a target layer of a layer stack and application thereof. The method for preparing a linea...