Intellectual Property India Publishes Patent Application for 'Method For Patterning A Mask, Method For Producing An Insert Or A Mold, And Optical Article With Surface Microstructures' Filed by Essilor International

MUMBAI, India, April 18 -- Intellectual Property India has published a patent application (202517029490 A) filed by Essilor International, Charenton-le-Pont, France, on March 27, for 'method for patterning a mask, method for producing an insert or a mold, and optical article with surface microstructures.'

Inventor(s) include Chiu, Hao-Wen.

The application for the patent was published on April 18, under issue no. 16/2025.

According to the abstract released by the Intellectual Property India: "The disclosure relates to a method for preparing an object having a curved surface to be etched, the resulting etched surface being useable as a mold for manufacturing an optical article. The method comprises illuminating the curved surface of the ob...