MUMBAI, India, June 6 -- Intellectual Property India has published a patent application (202417083230 A) filed by CNBM Research Institute For Advanced Glass Materials Group Co. Ltd., Anhui, China, on Oct. 30, 2024, for 'method for optimizing aspect ratio of metal grid based on surface modification.'
Inventor(s) include Shen, Yilei; and Stoelzel, Marko.
The application for the patent was published on June 6, under issue no. 23/2025.
According to the abstract released by the Intellectual Property India: "A method for optimizing the aspect ratio of a metal grid based on surface modification includes: obtaining a photovoltaic module including a front electrode; providing a laser process on the front electrode; and forming protrusion structur...