MUMBAI, India, March 7 -- Intellectual Property India has published a patent application (202527007664 A) filed by Atotech Deutschland Gmbh & Co. Kg, Berlin, on Jan. 29, for 'method for etching a plastic substrate including spraying and electrolytic regeneration.'
Inventor(s) include Heydecke, Jens; and Muigg, Michael.
The application for the patent was published on March 7, under issue no. 10/2025.
According to the abstract released by the Intellectual Property India: "The present invention relates to a method for etching a plastic substrate, the method comprising the steps (A) to (C), wherein step (C) includes an immersion-free dispensing of an acidic etching composition comprising water and one or more than one manganese species. Furt...