Intellectual Property India Publishes Patent Application for 'Method For Degradation Of Low Density Polyethene Using Bacterial Consortium' Filed by Siksha O Anusandhan

MUMBAI, India, Nov. 28 -- Intellectual Property India has published a patent application (202431059133 A) filed by Siksha O Anusandhan, Bhubaneswar, Orissa, on Aug. 5, 2024, for 'method for degradation of low density polyethene using bacterial consortium.'

Inventor(s) include Hrudayanath Thatoi; Subhashree Rath; and Pradeep Das Mohapatra.

The application for the patent was published on Nov. 28, under issue no. 48/2025.

According to the abstract released by the Intellectual Property India: "The present invention relates to a method for degradation of low density polyethene using bacterial consortium, comprises the steps of (i) isolating ligninolytic bacteria employing a minimal salt medium encriched with lignin, (ii) preparing a sterile s...