Intellectual Property India Publishes Patent Application for 'Method And Device For Removing Reactive Particles From A Vacuum Environment And Process Plant For Producing Monocrystalline Silicon Ingots' Filed by Flowserve Management Company

MUMBAI, India, May 2 -- Intellectual Property India has published a patent application (202547034272 A) filed by Flowserve Management Company, Irving, U.S.A., on April 8, for 'method and device for removing reactive particles from a vacuum environment and process plant for producing monocrystalline silicon ingots.'

Inventor(s) include Hencke Rayk; Lahn Stefan; Drechsel Julian; Meggers Nils; and Schreiner Jochen.

The application for the patent was published on May 2, under issue no. 18/2025.

According to the abstract released by the Intellectual Property India: "The invention relates to a method for removing reactive particles from a vacuum environment (14) in which a process gas is conveyed from the vacuum environment (14) by means of a ...