MUMBAI, India, June 13 -- Intellectual Property India has published a patent application (202517034803 A) filed by Massachusetts Institute Of Technology, Cambridge, U.S.A., on April 9, for 'line scanning temporally focused two photon lithography system.'
Inventor(s) include Boyden Edward; Oran Daniel; So Peter T.; and Zheng Cheng.
The application for the patent was published on June 13, under issue no. 24/2025.
According to the abstract released by the Intellectual Property India: "The present invention presents improved systems and methods for performing multi photon lithography. A line scanning temporally focused two photon lithography (LS TFTPL) technique is capable of patterning three dimensional structures with high throughput. An e...