Intellectual Property India Publishes Patent Application for 'Innovative Successive Ionic Layer Adsorption And Reaction Based Synthesis Of Tio2/Agbi2s3 Thin Films With Enhanced Optical Properties' Filed by Sachin Achalkumar Padwal

MUMBAI, India, Oct. 11 -- Intellectual Property India has published a patent application (202421028901 A) filed by Sachin Achalkumar Padwal, Nashik, Maharashtra, on April 9, 2024, for 'innovative successive ionic layer adsorption and reaction based synthesis of tio2/agbi2s3 thin films with enhanced optical properties.'

Inventor(s) include Sachin Achalkumar Padwal.

The application for the patent was published on Oct. 10, under issue no. 41/2025.

According to the abstract released by the Intellectual Property India: "In this invention, we introduce a novel method using the Successive Ionic Layer Adsorption and Reaction (SILAR) technique to synthesize AgBi2S3, an environmentally friendly ternary metal chalcogenide within the I-V-IV semicond...