Intellectual Property India Publishes Patent Application for 'Functionalized Colloidal Silica And Methods Of Production' Filed by W. R. Grace & Co. -Conn

MUMBAI, India, June 27 -- Intellectual Property India has published a patent application (202517054033 A) filed by W. R. Grace & Co. -Conn, Columbia, U.S.A., on June 4, for 'functionalized colloidal silica and methods of production.'

Inventor(s) include Gu, Feng; and Chapman, David M.

The application for the patent was published on June 27, under issue no. 26/2025.

According to the abstract released by the Intellectual Property India: "The present disclosure is directed to compositions that include water and a functionalized colloidal silica, where the functionalized colloidal silica includes silica particles (where each silica particle includes a surface) as well as a structural unit according to Formula I and/or a structural unit accor...