MUMBAI, India, June 6 -- Intellectual Property India has published a patent application (202517047291 A) filed by Jusung Engineering Co. Ltd., Gyeonggi, Republic of Korea, on May 16, for 'electrode formation method for semiconductor device.'
Inventor(s) include Kim Young Woon; Kim Su Vin; Park Seok Jin; Lee Yoon Ju; Hwang Chul Joo; and Yeo Seung Min.
The application for the patent was published on June 6, under issue no. 23/2025.
According to the abstract released by the Intellectual Property India: "An electrode formation method according to an embodiment of the present invention may include: a step of preparing a substrate; a step of forming a method thin film layer by spraying a precursor including ruthenium (Ru) on the substrate; a f...