MUMBAI, India, Nov. 7 -- Intellectual Property India has published a patent application (202514028059 A) filed by Caterpillar Inc., Peoria, U.S.A., on March 25, for 'duct for aftertreatment system.'
Inventor(s) include Biswas, Shib Shankar.
The application for the patent was published on Nov. 7, under issue no. 45/2025.
According to the abstract released by the Intellectual Property India: "A duct for an aftertreatment system includes a body defining a first end and a second end and a flange coupled to the body at the first end of the body. The flange defines an outer edge. The duct includes a projection coupled to and extending from the flange along a first direction. The projection and the flange lie in a same plane. The projection def...