MUMBAI, India, Nov. 7 -- Intellectual Property India has published a patent application (202514028766 A) filed by Caterpillar Inc., Peoria, U.S.A., on March 26, for 'duct for after treatment system.'
Inventor(s) include Biswas, Shib Shankar.
The application for the patent was published on Nov. 7, under issue no. 45/2025.
According to the abstract released by the Intellectual Property India: "A duct for an aftertreatment system includes a body defining an inlet opening, an outlet opening, and an inner surface extending from the inlet opening to the outlet opening. The duct includes a plurality of locating pads coupled to the inner surface of the body. Any one of the plurality of locating pads defines a slot. The duct includes a mixing dev...