MUMBAI, India, March 28 -- Intellectual Property India has published a patent application (202517009047 A) filed by Shiseido Company, Ltd.; and Nof Corporation, Tokyo, on Feb. 4, for 'cosmetic base.'
Inventor(s) include Ito, Yuji; Ishikawa, Riko; Ietani, Saori; Hara, Yusuke; Murai, Masaki; Sekiguchi, Koji; and Kimura, Hidetsugu.
The application for the patent was published on March 28, under issue no. 13/2025.
According to the abstract released by the Intellectual Property India: "Provided is a new cosmetic base that achieves both feel on use and a moisturizing effect. The cosmetic base contains or comprises a polymer having a structure represented by formula (1). In formula (1), R1, R2, and R3 each independently are a hydrogen atom or a...