MUMBAI, India, Feb. 21 -- Intellectual Property India has published a patent application (202517001359 A) filed by Newtech Textile Technology Development (SHANGHAI) Co. Ltd., Shanghai, on Jan. 7, for 'color control method, color control apparatus, and color control system.'
Inventor(s) include Chung, Po-Wen; Tian, Long; and Liu, Xingang.
The application for the patent was published on Feb. 21, under issue no. 08/2025.
According to the abstract released by the Intellectual Property India: "A color control method for CMYK field-jetting dyeing, which is characterized in that the method comprises: acquiring a fabric parameter of fabric to be dyed; acquiring the color of a piece of sample cloth; checking a field-jetting dyeing database to det...