MUMBAI, India, July 5 -- Intellectual Property India has published a patent application (202517056375 A) filed by Basf Se, Ludwigshafen am Rhein, Germany, on June 11, for 'closed loop recycling concept for composites comprising covalent adaptable poly(ureaurethane) networks with dynamic hindered urea bonds.'
Inventor(s) include Hammer, Larissa Maria; and Geyer, Florian Ludwig.
The application for the patent was published on July 4, under issue no. 27/2025.
According to the abstract released by the Intellectual Property India: "The present invention relates to a process for recycling a composition comprising a poly(urea- urethane) polymer with hindered urea bonds comprising the treatment of the composition comprising the poly(urea-urethan...