MUMBAI, India, Sept. 26 -- Intellectual Property India has published a patent application (202537069603 A) filed by Beijing Roborock Innovation Technology Co. Ltd., Beijing, on July 22, for 'cleaning control method and apparatus of cleaning base station, cleaning base station and storage medium.'

Inventor(s) include Long, Yongji; Liu, Yang; Liang, Zhenyu; Zhang, Tongsheng; and Zhang, Zhenpeng.

The application for the patent was published on Sept. 26, under issue no. 39/2025.

According to the abstract released by the Intellectual Property India: "A cleaning control method and apparatus of a cleaning base station, a cleaning base station and a storage medium. The cleaning control method comprises: when a cleaning base station cleans a clea...