Intellectual Property India Publishes Patent Application for 'Chemical Induced Process For Nano Finishing Of Silicon Wafer Surface' Filed by Amity University

MUMBAI, India, June 13 -- Intellectual Property India has published a patent application (202311083822 A) filed by Amity University, Noida, Uttar Pradesh, on Dec. 8, 2023, for 'chemical induced process for nano finishing of silicon wafer surface.'

Inventor(s) include Kheelraj Pandey; Ashwani Sharma; and Anil Kumar.

The application for the patent was published on June 13, under issue no. 24/2025.

According to the abstract released by the Intellectual Property India: "The present invention discloses Chemical induced process for Nano finishing of Silicon wafer surface and other such materials using single pole magnetic abrasive finishing. In the present invention, which identifies and fine-tunes three critical parameters to enhance the effi...