MUMBAI, India, Feb. 21 -- Intellectual Property India has published a patent application (202517007544 A) filed by Dow Global Technologies Llc, Midland, U.S.A., on Jan. 29, for 'asymmetrical hafnium metallocenes.'
Inventor(s) include Baillie, Rhett A.; Pearson, David M.; Mcdougal, Mahsa; Padilla-Acevedo, Angela I; Fontaine, Philip P.; Hirsekorn, Kurt F.; and Kuhlman, Roger L.
The application for the patent was published on Feb. 21, under issue no. 08/2025.
According to the abstract released by the Intellectual Property India: "Embodiments of the present disclosure are directed towards asymmetrical hafnium metallocenes, compositions including those asymmetrical hafnium metallocenes, and methods utilizing compositions including the asymmet...