MUMBAI, India, June 6 -- Intellectual Property India has published a patent application (202517014237 A) filed by Resonac Corporation, Tokyo, on Feb. 19, for 'asphalt composition and production method therefor.'
Inventor(s) include Ohguma Yuya; Shibuya Akira; and Ogawa Noriko.
The application for the patent was published on June 6, under issue no. 23/2025.
According to the abstract released by the Intellectual Property India: "[Problem] To provide: a composition which includes asphalt for road pavement and which has improved oil resistance; and a method for producing the composition. [Solution] Provided is an asphalt composition comprising asphalt and a chloroprene-based polymer, in which the content of the chloroprene-based polymer is 5...