Intellectual Property India Publishes Patent Application for 'Aqueous Solutions And Methods Of Using Same For Remediating Contaminants In Contaminated Gasses' Filed by Gaps Technology, Llc

MUMBAI, India, June 20 -- Intellectual Property India has published a patent application (202517028805 A) filed by Gaps Technology, Llc, Slidell, U.S.A., on March 26, for 'aqueous solutions and methods of using same for remediating contaminants in contaminated gasses.'

Inventor(s) include Roe, Cliffton; and Pourciau, Jerry.

The application for the patent was published on June 20, under issue no. 25/2025.

According to the abstract released by the Intellectual Property India: "A treatment process for removing and/or remediating contaminants in a contaminated gas includes flowing a stream of the contaminated gas through a pipeline, treating the flowing stream of the contaminated gas by injecting droplets of a liquid treatment composition co...