Intellectual Property India Publishes Patent Application for 'A System And Method For Mechanical Strain Engineering And Bandgap Modulation In A Semiconductor Nanomembrane' Filed by Indian Institute Of Technology

MUMBAI, India, July 11 -- Intellectual Property India has published a patent application (202521051888 A) filed by Indian Institute Of Technology, Bhilai, Chhattisgarh, on May 29, for 'a system and method for mechanical strain engineering and bandgap modulation in a semiconductor nanomembrane.'

Inventor(s) include Anjali Chaudhary; Soumya Tiwari; Tikendra Kumar; and Amit Rana.

The application for the patent was published on July 11, under issue no. 28/2025.

According to the abstract released by the Intellectual Property India: "The present invention relates to a system and method for mechanical strain engineering and bandgap modulation in a semiconductor nanomembrane comprise at least one pressure cell (101), at least one gas supply modu...