Intellectual Property India Publishes Patent Application for 'A Process For The Preparation Of An Attrition Resistant High Pore Volume Silica-Alumina Material' Filed by Reliance Industries Limited

MUMBAI, India, Aug. 8 -- Intellectual Property India has published a patent application (202421007441 A) filed by Reliance Industries Limited, Maharashtra, on Feb. 3, 2024, for 'a process for the preparation of an attrition resistant high pore volume silica-alumina material.'

Inventor(s) include Kumar Anuj; Thangaraju Murugan, Sankaranarayanan; Ravichandran Gopal; and Das Asit Kumar.

The application for the patent was published on Aug. 8, under issue no. 32/2025.

According to the abstract released by the Intellectual Property India: "The present disclosure relates to a process for the preparation of attrition resistant high pore volume silica-alumina material. The attrition resistant high pore volume silica-alumina materials obtained by ...