Intellectual Property India Publishes Patent Application for 'A Multi-Level Defect Detection Method For Detecting Defects In A Semiconductor Wafer' Filed by Samsung Electronics Co. Ltd.

MUMBAI, India, May 9 -- Intellectual Property India has published a patent application (202341075803 A) filed by Samsung Electronics Co. Ltd., Gyeonggi, Republic of Korea, on Nov. 6, 2023, for 'a multi-level defect detection method for detecting defects in a semiconductor wafer.'

Inventor(s) include Pai, Priyadarshini Panemangalore; Shinde, Prashant Pandurang; and Adiga, Shashishekara Parampalli.

The application for the patent was published on May 9, under issue no. 19/2025.

According to the abstract released by the Intellectual Property India: "Disclosed is a multi-level defect detection method (300) for detecting one or more defects in a semiconductor wafer. The method includes receiving input images each including an image of the semi...