MUMBAI, India, March 7 -- Intellectual Property India has published a patent application (202517013521 A) filed by Curium US Llc, St. Louis, on Feb. 17, for '[177lu] lutetium-psma l&t composition, kit, method of making, and method of using thereof.'
Inventor(s) include Jalomaki, Jarno; Seppanen, Salla; Donovan, Amanda; and Salem, Jessica.
The application for the patent was published on March 7, under issue no. 10/2025.
According to the abstract released by the Intellectual Property India: "The present disclosure generally relates to a radiopharmaceutical composition comprising 177Lu-PSMA I&T. The composition is formulated as a solution for injection and the solution is suitable for administration more than 72 hours after formulation. The...