India, April 29 -- What Is Electron Beam Lithography?

Electron beam lithography (EBL) is a technique for creating high-resolution patterns on a semiconductor substrate by directing a beam of electrons to selectively modify a thin layer of electron resist.

The resist is a photosensitive material that changes its solubility upon exposure to electrons. This change in solubility can be either positive (increased solubility) or negative (decreased solubility) depending on the type of resist used. This process transfers the pattern defined by the electron beam onto the underlying substrate.

How Does Electron Beam Lithography Work?

Electron beam lithography works like a tiny, digital sculpting process using a focussed beam of electrons. Here...