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INTERNATIONAL PATENT: AUTONETWORKS TECHNOLOGIES, LTD., 株式会社オートネットワーク技術研究所, SUMITOMO WIRING SYSTEMS, LTD., 住友電装株式会社, SUMITOMO ELECTRIC INDUSTRIES, LTD., 住友電気工業株式会社 FILES APPLICATION FOR "ELECTRICAL JUNCTION BOX"

GENEVA, April 15 -- AUTONETWORKS TECHNOLOGIES, LTD. (1-14, Nishisuehiro-cho, Yokkaichi-shi, Mie5108503), 株式会社オートネットワ&#12540... Read More


INTERNATIONAL PATENT: RESONAC CORPORATION, 株式会社レゾナック FILES APPLICATION FOR "RESIN COMPOSITION, PREPREG, LAYERED SHEET, PRINTED CIRCUIT BOARD AND SEMICONDUCTOR PACKAGE"

GENEVA, April 15 -- RESONAC CORPORATION (9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057325), 株式会社レゾナック (東京都&#2... Read More


INTERNATIONAL PATENT: YAMAMOTO ELECTRIC WORKS CO.,LTD., 株式会社山本電機製作所 FILES APPLICATION FOR "SUPERCONDUCTOR, METHOD FOR PRODUCING SUPERCONDUCTOR, LIQUID LEVEL SENSOR FOR LIQUID HYDROGEN AND LIQUID LEVEL GAUGE FOR LIQUID HYDROGEN"

GENEVA, April 15 -- YAMAMOTO ELECTRIC WORKS CO.,LTD. (1-2-3 Nishishiriike-cho, Nagata-ku, Kobe-city, Hyogo6530031), 株式会社山本電機製作&#25... Read More


INTERNATIONAL PATENT: OKURA INDUSTRIAL CO., LTD., 大倉工業株式会社 FILES APPLICATION FOR "ANAEROBIC ADHESIVE COMPOSITION FOR ELECTROMAGNETIC STEEL SHEET"

GENEVA, April 15 -- OKURA INDUSTRIAL CO., LTD. (1515, Nakazu-cho, Marugame-shi, Kagawa7638508), 大倉工業株式会社 (香川県丸&#2009... Read More


INTERNATIONAL PATENT: RESONAC CORPORATION, 株式会社レゾナック FILES APPLICATION FOR "PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR PRODUCING PRINTED WIRING BOARD"

GENEVA, April 15 -- RESONAC CORPORATION (9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057325), 株式会社レゾナック (東京都&#2... Read More


INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "SUBSTRATE SUPPORT ASSEMBLY, SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD"

GENEVA, April 15 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東&#2... Read More


INTERNATIONAL PATENT: SONY GROUP CORPORATION, ソニーグループ株式会社, SONY SEMICONDUCTOR SOLUTIONS CORPORATION, ソニーセミコンダクタソリューションズ株式会社 FILES APPLICATION FOR "INFORMATION PROCESSING METHOD, INFORMATION PROCESSING SYSTEM AND PROGRAM"

GENEVA, April 15 -- SONY GROUP CORPORATION (1-7-1, Konan, Minato-ku, Tokyo1080075), ソニーグループ株式会社 (東京都&#... Read More


INTERNATIONAL PATENT: MURATA MACHINERY, LTD., 村田機械株式会社 FILES APPLICATION FOR "STORAGE DEVICE"

GENEVA, April 15 -- MURATA MACHINERY, LTD. (3 Minami Ochiai-cho, Kisshoin, Minami-ku, Kyoto-shi, Kyoto6018326), 村田機械株式会社 (京都&#2422... Read More


INTERNATIONAL PATENT: SONY SEMICONDUCTOR SOLUTIONS CORPORATION, ソニーセミコンダクタソリューションズ株式会社 FILES APPLICATION FOR "INFORMATION PROCESSING DEVICE, TERMINAL DEVICE, INFORMATION PROCESSING SYSTEM AND DATA GENERATION METHOD"

GENEVA, April 15 -- SONY SEMICONDUCTOR SOLUTIONS CORPORATION (4-14-1, Asahi-cho, Atsugi-shi, Kanagawa2430014), ソニーセミコンダクタソ&... Read More


INTERNATIONAL PATENT: SHIMADZU CORPORATION, 株式会社島津製作所, NIKON CORPORATION, 株式会社ニコン FILES APPLICATION FOR "INTERFERENCE TYPE REFRACTOMETER AND REFRACTIVE INDEX MEASURING METHOD"

GENEVA, April 15 -- SHIMADZU CORPORATION (1, Nishinokyo Kuwabara-cho, Nakagyo-ku, Kyoto-shi, Kyoto6048511), 株式会社島津製作所 (京都&#... Read More