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INTERNATIONAL PATENT: FUJIFILM CORPORATION, 富士フイルム株式会社 FILES APPLICATION FOR "POROUS SEPARATOR FOR ALKALINE WATER ELECTROLYSIS, ALKALINE WATER ELECTROLYSIS MEMBER USING SAME, ALKALINE WATER ELECTROLYSIS CELL, ALKALINE WATER ELECTROLYSIS DEVICE AND HYDROGEN PRODUCTION METHOD"

GENEVA, Oct. 5 -- FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome, Minato-ku, Tokyo1068620), 富士フイルム株式会社 (東京都&... Read More


INTERNATIONAL PATENT: AESC JAPAN LTD., 株式会社AESCジャパン FILES APPLICATION FOR "LITHIUM ION SECONDARY BATTERY AND LITHIUM ION SECONDARY BATTERY MODULE"

GENEVA, Oct. 5 -- AESC JAPAN LTD. (K-Tower Yokohama, 6-2-12 Minatomirai, Nishi-ku, Yokohama-shi, Kanagawa2200012), 株式会社AESCジャ&#124... Read More


INTERNATIONAL PATENT: FUJIFILM CORPORATION, 富士フイルム株式会社 FILES APPLICATION FOR "RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE"

GENEVA, Oct. 5 -- FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome, Minato-ku, Tokyo1068620), 富士フイルム株式会社 (東京都&... Read More


INTERNATIONAL PATENT: SEKISUI KASEI CO., LTD., 積水化成品工業株式会社 FILES APPLICATION FOR "MOLDED BODY OF POLYLACTIC ACID RESIN FOAM"

GENEVA, Oct. 5 -- SEKISUI KASEI CO., LTD. (4-4, Nishitenma 2-chome, Kita-ku, Osaka-shi, Osaka5308565), 積水化成品工業株式会社 (&#22823... Read More


INTERNATIONAL PATENT: ROHTO PHARMACEUTICAL CO., LTD., ロート製薬株式会社 FILES APPLICATION FOR "COMPOSITION FOR HAIR AND/OR SCALP"

GENEVA, Oct. 5 -- ROHTO PHARMACEUTICAL CO., LTD. (1-8-1, Tatsumi-nishi, Ikuno-ku, Osaka-shi, Osaka5448666), ロート製薬株式会社 (大阪&#... Read More


INTERNATIONAL PATENT: FUJIFILM CORPORATION, 富士フイルム株式会社 FILES APPLICATION FOR "SEPARATOR FOR HYDROGEN PRODUCTION, ALKALINE WATER ELECTROLYSIS MEMBER USING SAME, ALKALINE WATER ELECTROLYSIS CELL USING SAME, ALKALINE WATER ELECTROLYSIS DEVICE USING SAME, METHOD FOR PRODUCING HYDROGEN USING SAME AND METHOD FOR PRODUCING SEPARATOR FOR HYDROGEN PRODUCTION"

GENEVA, Oct. 5 -- FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome, Minato-ku, Tokyo1068620), 富士フイルム株式会社 (東京都&... Read More


INTERNATIONAL PATENT: KYOCERA CORPORATION, 京セラ株式会社 FILES APPLICATION FOR "OPTICAL CIRCUIT BOARD AND MOUNTING STRUCTURE"

GENEVA, Oct. 5 -- KYOCERA CORPORATION (6 Takeda Tobadono-cho, Fushimi-ku, Kyoto-shi, Kyoto6128501), 京セラ株式会社 (京都府京都&#... Read More


INTERNATIONAL PATENT: MITSUBISHI GAS CHEMICAL COMPANY, INC., 三菱瓦斯化学株式会社 FILES APPLICATION FOR "SOLVENT AND COMPOSITION FOR SEMICONDUCTOR PRODUCTION USING SAME"

GENEVA, Oct. 5 -- MITSUBISHI GAS CHEMICAL COMPANY, INC. (5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo1008324), 三菱瓦斯化学株式会社 (東&... Read More


INTERNATIONAL PATENT: KYOCERA CORPORATION, 京セラ株式会社 FILES APPLICATION FOR "NOZZLE, NOZZLE UNIT AND COATING DEVICE"

GENEVA, Oct. 5 -- KYOCERA CORPORATION (6, Takeda Tobadono-cho, Fushimi-ku, Kyoto-shi, Kyoto6128501), 京セラ株式会社 (京都府京都&... Read More


INTERNATIONAL PATENT: QD LASER, INC., 株式会社QDレーザ FILES APPLICATION FOR "EXAMINATION DEVICE AND EXAMINATION METHOD"

GENEVA, Oct. 5 -- QD LASER, INC. (1-1 Minamiwataridacho, Kawasaki-ku, Kawasaki-shi, Kanagawa2100855), 株式会社QDレーザ (神奈川... Read More