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INTERNATIONAL PATENT: TOYOTA BOSHOKU KABUSHIKI KAISHA, トヨタ紡織株式会社, KYOTO UNIVERSITY, 国立大学法人京都大学 FILES APPLICATION FOR "FIBROUS SUBSTANCE, METHOD FOR PRODUCING SAME AND POWDER"

GENEVA, Oct. 5 -- TOYOTA BOSHOKU KABUSHIKI KAISHA (1-1, Toyoda-cho, Kariya-shi, Aichi4488651), トヨタ紡織株式会社 (愛知県&#21000... Read More


INTERNATIONAL PATENT: FUJITSU GENERAL LIMITED, 株式会社富士通ゼネラル FILES APPLICATION FOR "BLOWER DEVICE, HEAT SOURCE-SIDE UNIT OF REFRIGERATION CYCLE DEVICE COMPRISING SAID BLOWER DEVICE, UTILIZATION-SIDE UNIT OF REFRIGERATION CYCLE DEVICE, REFRIGERATION CYCLE DEVICE, VENTILATION UNIT AND AIR CLEANER"

GENEVA, Oct. 5 -- FUJITSU GENERAL LIMITED (3-3-17, Suenaga, Takatsu-ku, Kawasaki-shi, Kanagawa2138502), 株式会社富士通ゼネラル (&#3107... Read More


INTERNATIONAL PATENT: ENEOS MATERIALS CORPORATION, 株式会社ENEOSマテリアル FILES APPLICATION FOR "METHOD FOR MANUFACTURING LITHIUM ION SECONDARY BATTERY ACTIVE MATERIAL LAYER, METHOD FOR MANUFACTURING LITHIUM ION SECONDARY BATTERY ELECTRODE AND LITHIUM ION SECONDARY BATTERY"

GENEVA, Oct. 5 -- ENEOS MATERIALS CORPORATION (5-2, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057109), 株式会社ENEOSマテ&#12522... Read More


INTERNATIONAL PATENT: AESC JAPAN LTD., 株式会社AESCジャパン FILES APPLICATION FOR "LITHIUM ION SECONDARY BATTERY AND LITHIUM ION SECONDARY BATTERY MODULE"

GENEVA, Oct. 5 -- AESC JAPAN LTD. (K-Tower Yokohama, 6-2-12 Minatomirai, Nishi-ku, Yokohama-shi, Kanagawa2200012), 株式会社AESCジャ&#124... Read More


INTERNATIONAL PATENT: TORAY INDUSTRIES, INC., 東レ株式会社 FILES APPLICATION FOR "POLYLACTIC ACID MONOFILAMENT, METHOD FOR MELT-SPINNING SAME AND FIBER PRODUCT"

GENEVA, Oct. 5 -- TORAY INDUSTRIES, INC. (1-1, Nihonbashi-Muromachi 2-chome, Chuo-ku, Tokyo1038666), 東レ株式会社 (東京都中央区&... Read More


INTERNATIONAL PATENT: AESC JAPAN LTD., 株式会社AESCジャパン FILES APPLICATION FOR "LITHIUM ION SECONDARY BATTERY AND LITHIUM ION SECONDARY BATTERY MODULE"

GENEVA, Oct. 5 -- AESC JAPAN LTD. (K-Tower Yokohama, 6-2-12 Minatomirai, Nishi-ku, Yokohama-shi, Kanagawa2200012), 株式会社AESCジャ&#124... Read More


INTERNATIONAL PATENT: FUJIFILM CORPORATION, 富士フイルム株式会社 FILES APPLICATION FOR "METHOD FOR PRODUCING RESIN, METHOD FOR PRODUCING ACTIVE LIGHT RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE"

GENEVA, Oct. 5 -- FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome, Minato-ku, Tokyo1068620), 富士フイルム株式会社 (東京都&... Read More


INTERNATIONAL PATENT: MITSUI CHEMICALS, INC., 三井化学株式会社 FILES APPLICATION FOR "SEALANT FOR DISPLAY ELEMENT, METHOD FOR PRODUCING SAME AND DISPLAY DEVICE"

GENEVA, Oct. 5 -- MITSUI CHEMICALS, INC. (2-1, Yaesu 2-chome, Chuo-ku, Tokyo1040028), 三井化学株式会社 (東京都中央区... Read More


INTERNATIONAL PATENT: KANADEVIA CORPORATION, カナデビア株式会社 FILES APPLICATION FOR "ALL-SOLID-STATE BATTERY AND METHOD FOR MANUFACTURING SAME"

GENEVA, Oct. 5 -- KANADEVIA CORPORATION (7-89, Nanko-Kita 1-chome, Suminoe-ku, Osaka-shi, Osaka5598559), カナデビア株式会社 (大阪&#242... Read More


INTERNATIONAL PATENT: MITSUBISHI GAS CHEMICAL COMPANY, INC., 三菱瓦斯化学株式会社 FILES APPLICATION FOR "SOLVENT AND SEMICONDUCTOR COMPOSITION USING SAME"

GENEVA, Oct. 5 -- MITSUBISHI GAS CHEMICAL COMPANY, INC. (5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo1008324), 三菱瓦斯化学株式会社 (東&... Read More