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INTERNATIONAL PATENT: NIKON-ESSILOR CO.,LTD., 株式会社ニコン・エシロール FILES APPLICATION FOR "EVALUATION METHOD, DESIGN METHOD, SELECTION METHOD AND MANUFACTURING METHOD FOR SPECTACLE LENS"

GENEVA, Oct. 5 -- NIKON-ESSILOR CO.,LTD. (10-8, Ryogoku 2-chome, Sumida-ku, Tokyo1300026), 株式会社ニコン・エシロール (&#2... Read More


INTERNATIONAL PATENT: NISSAN CHEMICAL CORPORATION, 日産化学株式会社 FILES APPLICATION FOR "COMPOSITION FOR FORMING COATING FILM FOR FOREIGN SUBSTANCE REMOVAL AND SEMICONDUCTOR SUBSTRATE"

GENEVA, Oct. 5 -- NISSAN CHEMICAL CORPORATION (5-1, Nihonbashi 2-chome, Chuo-ku, Tokyo1036119), 日産化学株式会社 (東京都中&#2283... Read More


INTERNATIONAL PATENT: GCE INSTITUTE INC., 株式会社GCEインスティチュート FILES APPLICATION FOR "POWER GENERATION ELEMENT, POWER GENERATION CARTRIDGE, ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING POWER GENERATION ELEMENT"

GENEVA, Oct. 5 -- GCE INSTITUTE INC. (Tsukuba Sogyo Plaza, 2-1-6 Sengen, Tsukuba-shi, Ibaraki3050047), 株式会社GCEインスティ&... Read More


INTERNATIONAL PATENT: DAIKIN INDUSTRIES, LTD., ダイキン工業株式会社 FILES APPLICATION FOR "TEMPERATURE ADJUSTMENT DEVICE"

GENEVA, Oct. 5 -- DAIKIN INDUSTRIES, LTD. (Osaka Umeda Twin Towers South, 1-13-1, Umeda, Kita-ku, Osaka-Shi, Osaka5300001), ダイキン工業株式会&#31... Read More


INTERNATIONAL PATENT: TORAY INDUSTRIES, INC., 東レ株式会社 FILES APPLICATION FOR "WEARABLE BAND FOR MEASURING BIOLOGICAL SIGNALS"

GENEVA, Oct. 5 -- TORAY INDUSTRIES, INC. (1-1, Nihonbashi-Muromachi 2-chome, Chuo-ku, Tokyo1038666), 東レ株式会社 (東京都中央区&... Read More


INTERNATIONAL PATENT: OSAKA UNIVERSITY, 国立大学法人大阪大学, TANAKA PRECIOUS METAL TECHNOLOGIES CO., LTD., 田中貴金属工業株式会社 FILES APPLICATION FOR "BONDING MATERIAL AND BONDING METHOD EMPLOYING SAID BONDING MATERIAL"

GENEVA, Oct. 5 -- OSAKA UNIVERSITY (1-1, Yamadaoka, Suita-shi, Osaka5650871), 国立大学法人大阪大学 (大阪府吹田... Read More


INTERNATIONAL PATENT: IDEMITSU KOSAN CO.,LTD., 出光興産株式会社 FILES APPLICATION FOR "METHOD FOR PRODUCING SULFIDE SOLID ELECTROLYTE"

GENEVA, Oct. 5 -- IDEMITSU KOSAN CO.,LTD. (2-1, Otemachi 1-chome, Chiyoda-ku, Tokyo1008321), 出光興産株式会社 (東京都千代&... Read More


INTERNATIONAL PATENT: FUJIFILM CORPORATION, 富士フイルム株式会社 FILES APPLICATION FOR "METHOD FOR PRODUCING RESIN, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE"

GENEVA, Oct. 5 -- FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome, Minato-ku, Tokyo1068620), 富士フイルム株式会社 (東京都&... Read More


INTERNATIONAL PATENT: NUVOTON TECHNOLOGY CORPORATION JAPAN, ヌヴォトンテクノロジージャパン株式会社 FILES APPLICATION FOR "MOTOR DRIVE DEVICE"

GENEVA, Oct. 5 -- NUVOTON TECHNOLOGY CORPORATION JAPAN (1 Kotari-yakemachi, Nagaokakyo City, Kyoto6178520), ヌヴォトンテクノロジー&#12... Read More


INTERNATIONAL PATENT: IDEMITSU KOSAN CO.,LTD., 出光興産株式会社 FILES APPLICATION FOR "ELECTRODE MATERIAL"

GENEVA, Oct. 5 -- IDEMITSU KOSAN CO.,LTD. (2-1, Otemachi 1-chome, Chiyoda-ku, Tokyo1008321), 出光興産株式会社 (東京都千代&... Read More