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INTERNATIONAL PATENT: SONY GROUP CORPORATION, ソニーグループ株式会社 FILES APPLICATION FOR "COMPOUND, CONJUGATE, LIGHT EMISSION DETECTION SYSTEM AND MEASUREMENT DEVICE"

GENEVA, Feb. 25 -- SONY GROUP CORPORATION (1-7-1 Konan, Minato-ku, Tokyo1080075), ソニーグループ株式会社 (東京都&#28... Read More


INTERNATIONAL PATENT: UTILIZATION OF CARBON DIOXIDE INSTITUTE CO., LTD., 株式会社CO2資源化研究所 FILES APPLICATION FOR "SECRETION SIGNAL PEPTIDE GENE DERIVED FROM BACTERIUM OF GENUS HYDROGENOPHILUS"

GENEVA, Feb. 25 -- UTILIZATION OF CARBON DIOXIDE INSTITUTE CO., LTD. (14F Tradepia Odaiba Bldg., 2-3-1 Daiba, Minato-ku, Tokyo1350091), 株式会社CO2資... Read More


INTERNATIONAL PATENT: LECHAINON CO., LTD., 株式会社ルシェノン FILES APPLICATION FOR "NAIL EVALUATING PROGRAM, DEVICE AND METHOD"

GENEVA, Feb. 25 -- LECHAINON CO., LTD. (#201 Claire 1st Building, 13-16 Chigasaki-Chuo, Tsuzuki-ku Yokohama-shi, Kanagawa2240032), 株式会社ルシェノ&#125... Read More


INTERNATIONAL PATENT: ROLAND DG CORPORATION, ローランドディー.ジー.株式会社 FILES APPLICATION FOR "PRINTER AND PRINTING METHOD"

GENEVA, Feb. 25 -- ROLAND DG CORPORATION (1-1-2, Shinmiyakoda, Hamana-ku, Hamamatsu-shi, Shizuoka4312103), ローランドディー.ジー&#652... Read More


INTERNATIONAL PATENT: FUJIKURA LTD., 株式会社フジクラ FILES APPLICATION FOR "METHOD FOR PRODUCING STRUCTURE, STEREOLITHOGRAPHY METHOD AND STEREOLITHOGRAPHY DEVICE"

GENEVA, Feb. 25 -- FUJIKURA LTD. (1-5-1, Kiba, Koto-ku, Tokyo1358512), 株式会社フジクラ (東京都江東区木&#22580... Read More


INTERNATIONAL PATENT: MITSUBISHI GAS CHEMICAL COMPANY, INC., 三菱瓦斯化学株式会社 FILES APPLICATION FOR "POLYCARBONATE RESIN"

GENEVA, Feb. 25 -- MITSUBISHI GAS CHEMICAL COMPANY, INC. (5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo1008324), 三菱瓦斯化学株式会社 (東... Read More


INTERNATIONAL PATENT: TOPPAN HOLDINGS INC., TOPPANホールディングス株式会社 FILES APPLICATION FOR "SKIN ADHESIVE SHEET"

GENEVA, Feb. 25 -- TOPPAN HOLDINGS INC. (5-1, Taito 1-chome, Taito-ku, Tokyo1100016), TOPPANホールディングス&#... Read More


INTERNATIONAL PATENT: AGC INC., AGC株式会社 FILES APPLICATION FOR "SUBSTRATE EQUIPPED WITH MULTILAYER REFLECTIVE FILM, METHOD FOR MANUFACTURING SUBSTRATE EQUIPPED WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD FOR MANUFACTURING REFLECTIVE MASK"

GENEVA, Feb. 25 -- AGC INC. (5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008405), AGC株式会社 (東京都千代田区&#200... Read More


INTERNATIONAL PATENT: KANEKA CORPORATION, 株式会社カネカ FILES APPLICATION FOR "POLYACRYLONITRILE-BASED ARTIFICIAL HAIR, HEAD ORNAMENT PRODUCT COMPRISING SAME AND METHOD FOR PRODUCING SAME"

GENEVA, Feb. 25 -- KANEKA CORPORATION (3-18, Nakanoshima 2-chome, Kita-ku, Osaka-shi, Osaka5308288), 株式会社カネカ (大阪府大阪&... Read More


INTERNATIONAL PATENT: SONY SEMICONDUCTOR SOLUTIONS CORPORATION, ソニーセミコンダクタソリューションズ株式会社 FILES APPLICATION FOR "RANGING DEVICE AND RANGING METHOD"

GENEVA, Feb. 25 -- SONY SEMICONDUCTOR SOLUTIONS CORPORATION (4-14-1 Asahicho, Atsugi-shi, Kanagawa2430014), ソニーセミコンダクタソ&#12... Read More