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INTERNATIONAL PATENT: NIPPON KAYAKU KABUSHIKI KAISHA, 日本化薬株式会社 FILES APPLICATION FOR "COMPOUND, METHOD FOR PRODUCING SAME, CURABLE RESIN COMPOSITION AND CURED PRODUCT OF SAME"

GENEVA, April 1 -- NIPPON KAYAKU KABUSHIKI KAISHA (1-1, Marunouchi 2-chome, Chiyoda-ku, Tokyo1000005), 日本化薬株式会社 (東京都&#21315... Read More


INTERNATIONAL PATENT: PFA CORPORATION, 株式会社PFA FILES APPLICATION FOR "COATING HEAD AND COATING DEVICE EQUIPPED WITH SAME"

GENEVA, April 1 -- PFA CORPORATION (5-7-1 Chiyoda, Sakado-shi, Saitama3500286), 株式会社PFA (埼玉県坂戸市千&#2019... Read More


INTERNATIONAL PATENT: POLYPLASTICS CO., LTD., ポリプラスチックス株式会社 FILES APPLICATION FOR "POLYETHER KETONE RESIN COMPOSITION AND MOLDED ARTICLE"

GENEVA, April 1 -- POLYPLASTICS CO., LTD. (2-18-1, Konan, Minato-ku, Tokyo1088280), ポリプラスチックス株式会社 (東&#... Read More


INTERNATIONAL PATENT: MATSUSHITA FUJITO, 松下 富士登 FILES APPLICATION FOR "BRAKE SYSTEM"

GENEVA, April 1 -- MATSUSHITA Fujito (Via Grado, 19 Milan20125), 松下 富士登 (ミラノ県ミラノ市グラ&#125... Read More


INTERNATIONAL PATENT: NIPPON ELECTRIC GLASS CO., LTD., 日本電気硝子株式会社 FILES APPLICATION FOR "MELTING FURNACE AND METHOD FOR MANUFACTURING GLASS ARTICLE"

GENEVA, April 1 -- NIPPON ELECTRIC GLASS CO., LTD. (7-1, Seiran 2-chome, Otsu-shi, Shiga5208639), 日本電気硝子株式会社 (滋賀&#30... Read More


INTERNATIONAL PATENT: UNICHARM CORPORATION, ユニ・チャーム株式会社 FILES APPLICATION FOR "METHOD FOR MANUFACTURING UNDERPANTS-TYPE ABSORBENT ARTICLE AND DEVICE FOR MANUFACTURING UNDERPANTS-TYPE ABSORBENT ARTICLE"

GENEVA, April 1 -- UNICHARM CORPORATION (182, Shimobun, Kinsei-cho, Shikokuchuo-City, Ehime7990111), ユニ・チャーム株式会社 (愛&... Read More


INTERNATIONAL PATENT: MEIDENSHA CORPORATION, 株式会社明電舎 FILES APPLICATION FOR "BUSHING STRUCTURE AND ELECTRIC APPARATUS"

GENEVA, April 1 -- MEIDENSHA CORPORATION (1-1, Osaki 2-chome, Shinagawa-ku, Tokyo1416029), 株式会社明電舎 (東京都品川区&#2... Read More


INTERNATIONAL PATENT: TORAY INDUSTRIES, INC., 東レ株式会社 FILES APPLICATION FOR "NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM AND ELECTRONIC COMPONENT USING SAME"

GENEVA, April 1 -- TORAY INDUSTRIES, INC. (1-1, Nihonbashi-Muromachi 2-chome, Chuo-ku, Tokyo1038666), 東レ株式会社 (東京都中央区... Read More


INTERNATIONAL PATENT: RESONAC CORPORATION, 株式会社レゾナック FILES APPLICATION FOR "SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE"

GENEVA, April 1 -- RESONAC CORPORATION (9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057325), 株式会社レゾナック (東京都&#28... Read More


INTERNATIONAL PATENT: MURATA MANUFACTURING CO., LTD., 株式会社村田製作所 FILES APPLICATION FOR "SURFACE TREATMENT METHOD FOR TOOL, TOOL AND SOFT MATERIAL PROCESSING METHOD"

GENEVA, April 1 -- MURATA MANUFACTURING CO., LTD. (10-1, Higashikotari 1-chome, Nagaokakyo-shi, Kyoto6178555), 株式会社村田製作所 (京&#37117... Read More